logo

Standards Manage Your Business

We Manage Your Standards

ISO

ISO 14701:2018

Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness

Standard Details

This document specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy. It is only applicable to flat, polished samples and for instruments that incorporate an Al or Mg X-ray source, a sample stage that permits defined photoelectron emission angles and a spectrometer with an input lens that can be restricted to less than a 6° cone semi-angle. For thermal oxides in the range 1 nm to 8 nm thickness, using the best method described in this document, uncertainties, at a 95 % confidence level, could typically be around 2 % and around 1 % at optimum. A simpler method is also given with slightly poorer, but often adequate, uncertainties.

General Information

Status : Published
Standard Type: Main
Document No: ISO 14701:2018
Document Year: 2018
Pages: 17
Edition: 2

Life Cycle

Currently Viewing

Published
ISO 14701:2018
Knowledge Corner

Expand Your Knowledge and Unlock Your Learning Potential - Your One-Stop Source for Information!

© Copyright 2024 BSB Edge Private Limited.

Enquire now +