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ISO 17560:2002

Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon

Standard Details

ISO 17560:2002 specifies a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon, and using stylus profilometry or optical interferometry for depth scale calibration. This method is applicable to single-crystal, poly-crystal or amorphous-silicon specimens with boron atomic concentrations between 1×1016 atoms/cm3 and 1×1020 atoms/cm3, and to crater depths of 50 nm or deeper.

General Information

Status : WITHDRAWN
Standard Type: Main
Document No: ISO 17560:2002
Document Year: 2002
Pages: 10
Edition: 1

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WITHDRAWN
ISO 17560:2002
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