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ISO

ISO 23170:2022

Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

Standard Details

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

General Information

Status : Published
Standard Type: Main
Document No: ISO 23170:2022
Document Year: 2022
Pages: 29
Edition: 1

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ISO 23170:2022
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