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ISO 21859:2019

Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

Standard Details

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

General Information

Status : Published
Standard Type: Main
Document No: ISO 21859:2019
Document Year: 2019
Pages: 4
Edition: 1

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ISO 21859:2019
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